Stationary carbon cathodic arc: Plasma and film characterization

Journal of Applied Physics

Volumn 79, Issue 5, 1996, Pages 2237-2244

  Chhowalla, M ^a   Davis, C A ^a   Weiler, M ^a,b   Kleinsorge, B ^a   Amaratunga, G A J ^a,c  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^c UNIVERSITY OF LIVERPOOL   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001096605     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362656     Document Type: Article

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