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Applied Physics A: Materials Science and Processing

Volumn 97, Issue 3, 2009, Pages 627-633

Hafnium oxide thin films deposited from a filtered cathodic vacuum arc

(4) Field, M R a Partridge, J G a Du Plessis, J a McCulloch, D G a

a RMIT UNIVERSITY (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON ENERGY LOSS SPECTROSCOPY; OXIDES; PHOTOELECTRONS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CROSS SECTIONAL TRANSMISSION ELECTRON MICROSCOPY; DEPOSITION CONDITIONS; FILTERED CATHODIC VACUUM ARC; HAFNIUM OXIDE THIN FILMS; MONOCLINIC HFO; STRUCTURAL CHARACTERISTICS; SUBSTRATE BIAS VOLTAGES; SURFACE IMAGING;

HAFNIUM OXIDES;

EID: 79955387482 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-009-5263-6 Document Type: Article

Times cited : (2)

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