The structural phases of non-crystalline carbon prepared by physical vapour deposition

Carbon

Volumn 47, Issue 14, 2009, Pages 3263-3270

  Lau, D W M ^a   Moafi, A ^a   Taylor, M B ^a   Partridge, J G ^a   McCulloch, D G ^a   Powles, R C ^b   McKenzie, D R ^b  

^a RMIT UNIVERSITY   (Australia)

^b UNIVERSITY OF SYDNEY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODIC ARC DEPOSITION; CONTOUR PLOT; DEPOSITION CONDITIONS; ELECTRICAL RESISTANCES; FILM DENSITY; GRAPHITIC MATERIALS; INTRINSIC STRESS; ION ENERGIES; ION IMPACT; ION IMPACT ENERGY; LOWER DENSITY; PHYSICAL VAPOUR DEPOSITION; PICOSECONDS; ROOM TEMPERATURE; STRUCTURAL FORM; STRUCTURAL PHASIS; STRUCTURAL REARRANGEMENT; SUBSTRATE TEMPERATURE; TETRAHEDRAL AMORPHOUS CARBON (TA-C); THERMAL SPIKES; TIME-SCALES;

AMORPHOUS CARBON; AMORPHOUS FILMS; CRYSTALLINE MATERIALS; ION BOMBARDMENT; IONS; MICROSTRUCTURE; SUBSTRATES;

CARBON FILMS;

EID: 69649092923     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2009.07.044     Document Type: Article

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