Production of N and O atoms in flowing Ar-N2-O2 microwave discharges with separated N2 and O2 pulsed gases

Plasma Sources Science and Technology

Volumn 20, Issue 2, 2011, Pages

  Bernardelli, E A ^a   Ricard, A ^b   Belmonte, T ^a  

^a INSTITUT JEAN LAMOUR   (France)

^b Laboratoire Plasma et Conversion d'Energie   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AR PLASMAS; CONTINUUM EMISSION; DENSITY LEVELS; LOW FREQUENCY; MICROWAVE DISCHARGE; MICROWAVE PLASMA; NO TITRATION; PLASMA ELECTRONS; PLASMA EMISSION SPECTROSCOPY; SILICA TUBES;

ATOMS; EMISSION SPECTROSCOPY; IMPURITIES; OXYGEN; PLASMAS; SILICA; TITRATION;

ELECTRIC DISCHARGES;

EID: 79953677786     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/20/2/025012     Document Type: Article

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