Modelling of a N2-O2 flowing afterglow for plasma sterilization

Journal of Physics D: Applied Physics

Volumn 38, Issue 3, 2005, Pages 417-430

  Pintassilgo, C D ^a,b   Loureiro, J ^a   Guerra, V ^a  

^a INSTITUTO SUPERIOR TÉCNICO   (Portugal)

^b UNIVERSITY OF PORTO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION (PROCESS); DNA; ELECTRIC FIELDS; GAMMA RAYS; NITROGEN; OXYGEN; PHOTONS; PLASMAS;

KINETIC MODELS; MICROWAVE DISCHARGE; PLASMA STERILIZATION; SPECTROSCOPIC MEASUREMENTS;

STERILIZATION (CLEANING);

EID: 13844272691     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/38/3/011     Document Type: Article

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