Time varying afterglow emission and gas pressure in a pulsed N2 gas microwave flowing discharge at reduced pressure

EPJ Applied Physics

Volumn 49, Issue 1, 2010, Pages

  Ricard, A ^a   Moser, F ^a   Cousty, S ^a   Villeger, S ^a   Sarrette, J P ^a  

^a Laboratoire Plasma et Conversion d'Energie   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AFTERGLOW EMISSION; ATOM DENSITY; CONTINUOUS FLOWS; DISCHARGE CONDITIONS; DUTY CYCLES; GAS PRESSURES; INTENSITY RATIO; LOWER PRESSURES; MICROWAVE POWER; NITROGEN GAS FLOW; POSITIVE SYSTEMS; POST-DISCHARGE; PRESSURE VARIATIONS; REDUCED PRESSURE; REFLECTED POWER; TIME VARYING; TRANSMITTED POWER;

ATOMS; ELECTRIC DISCHARGES; ELECTRIC POWER MEASUREMENT; EMISSION SPECTROSCOPY; GAS DISCHARGE TUBES; GASES; MICROWAVES; NITROGEN PLASMA;

LEAKAGE (FLUID);

EID: 73149100125     PISSN: 12860042     EISSN: 12860050     Source Type: Journal    
DOI: 10.1051/epjap/2009195     Document Type: Article

References (8)

1. S. Villeger, J.P. Sarrette, A. Ricard, Plasmas Process. Polym. 2, 709 (2005)
2. S. Villeger, S. Cousty, A. Ricard, M. Sixou, J. Phys. D 36, L6 (2003)
3. S. Villeger, J.P. Sarrette, B. Rouffet, S. Cousty, A. Ricard, Eur. Phys. J. Appl. Phys. 42, 25 (2008)
4. P. Merel, M. Tabbal, M. Chaker, M. Moisan, A. Ricard, Plasma Sources Sci. Technol. 7, 550 (1998)
5. A. Ricard, M. Touzeau, M. Moisan, J. Phys. France 38, 669 (1977)
6. N. Britun, M. Gaillard, A. Ricard, Y.M. Kim, K.S. Kim, J.G. Han, J. Phys. D 40, 1022 (2007)
7. A. Ricard, J. Tetrault, J. Hubert, J. Phys. B 24, 1115 (1991)
8. M.K. Boudam, B. Saoudi, M. Moisan, A. Ricard, J. Phys. D 40, 1694 (2007)