Role of the temperature on the interaction mechanisms between argon-oxygen post-discharge and hexatriacontane

Plasma Chemistry and Plasma Processing

Volumn 28, Issue 4, 2008, Pages 495-509

  Mafra, M ^a,b   Belmonte, T ^a   Poncin Epaillard, F ^c   Da Silva Sobrinho, A S ^b   Maliska, A ^b  

^a INSTITUT JEAN LAMOUR   (France)

^b FEDERAL UNIVERSITY OF SANTA CATARINA   (Brazil)

^c UNIVERSITÉ DU MAINE   (France)

Author keywords

Hexatriacontane; Plasma cleaning; Post discharge

Indexed keywords

HEXATRIACONTANE; INTERACTION MECHANISMS; PLASMA CLEANING; POST DISCHARGES; POST-DISCHARGE;

ARGON; INERT GASES; NONMETALS; OXYGEN;

FLOW INTERACTIONS;

EID: 50149120719     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-008-9140-4     Document Type: Article

References (30)

1. Baránková H, Bardos L (2006) Vacuum 80(7):688-692
2. Hsieh JH, Li C (2006) Thin Solid Films 504(1-2):101-103
3. Gupta P, Tenhundfeld G, Daigle EO, Ryabkov D (2007) Surf Coat Technol 201(21):8746-8760
4. Ferreira JA, Tabarés FL, Tafalla D (2007) J Nucl Mater 363-365:888-892
5. González-Posada F, Bardwell JA, Moisa S, Haffouz S, Tang H, Braña AF, Muñoz E (2007) Appl Surf Sci 253(14):6185-6190
6. Belkind A, Zarrabian S, Engle F (1996) Metal Finish 94(7):19-22
7. Belkind A, Li H, Clow H, Jansen F (1995) Surf Coat Technol 76-77(2):738-743
8. Krüger P, Knes R, Friedrich J (1999) Surf Coat Technol 112(1-3):240-244
9. Santos MA, Silva HRT, Maliska AM, Klein AN, Muzart JLR (2005) Surf Coat Technol 195(2-3):198-203
10. Lefèvre L, Belmonte T, Czerwiec T, Ricard A, Michel H (2000) Appl Surf Sci 153(2-3):85-95
11. Hody V, Belmonte T, Pintassilgo C, Poncin-Epaillard F, Czerwiec T, Henrion G, Segui Y, Loureiro J (2006) Plasma Chem Plasma Proc 26(3):251-266
12. Hody V, Belmonte T, Czerwiec T, Henrion G, Thiébaut JM (2006) Thin Solid Films 506-507:212-216
13. Belmonte T, Pintassilgo C, Czerwiec T, Henrion G, Hody V, Thiébaut JM, Loureiro J (2005) Surf Coat Technol 200(1-4):26-30
14. Murillo R, Poncin-Epaillard F, Segui Y (2007) Eur Phys J Appl Phys 37:299-305
15. Fozza AC, Bergeron A, Klemberg-Sapieha JE, Wertheimer MR (1999) In: Lee WW, d'Agostino R, Wertheimer MR (eds) Plasma deposition and treatment of polymers symposium, pp 109-114
16. Fozza AC, Roch J, Klemberg-Sapieha JE, Kruse A, Holländer A, Wertheimer MR (1997) Nucl Instrum Methods Phys Res Sect B 131-1/4:205-210
17. Wertheimer MR, Fozza AC, Holländer A (1999) Nucl Instrum Methods Phys Res Sect B 151:65-75
18. Normand F, Granier A, Leprince P, Marec J, Shi MK, Clouet F (1995) Plasma Chem Plasma Proc 15(2):173-197
19. Clouet F, Shi MK, Prat R, Holl Y, Marie P, Léonard D, De Puydt Y, Bertrand P, Dewez J-L, Doren A (1994) J Adhes Sci Technol 8-4:329-361
20. Collart EJH, Baggerman JAG, Visser RJ (1995) J Appl Phys 78(1):47-54
21. Eggito FD (1990) Pure Appl Chem 62(9):1699-1708
22. Eggito FD, Matienzo LJ (1994) IBM J Res Develop 38(4):423-439
23. Eggito FD, Emmi F, Horwath RS, Vukanovic V (1985) J Vac Sci Technol B 3(3):893-904
24. Leonard D, Bertrand P, Scheuer A, Prat R, Hommet J, Le-Moigne J, Deville JP (1996) J Adhes Sci Technol 10-11:1165-1197
25. SCA, USR-59, CNRS. http://www.sca.cnrs.fr/
26. Mafra M, Belmonte T, da Silva Sobrinho AS, Maliska A, Cvelbar U, Poncin-Epaillard F (2008) Key Eng Mater 373-374:421-425
27. Bellamy LJ (1975) The Infra-red spectra of complex molecules, 3rd edn. Chapman and Hall Ltd
28. Medhekar VS, Degree of Master of Science in Chemical Engineering (2001) Worcester Polytechnic Institute.
29. See also Medhekar V, Thompson RW, Wang A, Grant McGimpsey W (2002) J Appl Polym Sci 87(5):814-826;
30. Alam TM, Celina M, Collier JP, Currier BH, Currier JH, Jackson SK, Kuethe DO, Timmins GS (2004) J Polym Sci Part A: Polym Chem 42(23):5929-5941