Modelling the low-pressure N2-O2 plasma afterglow to determine the kinetic mechanisms controlling the UV emission intensity and its spatial distribution for achieving an efficient sterilization process

Plasma Processes and Polymers

Volumn 5, Issue 9, 2008, Pages 840-852

  Kutasi, Kinga ^a,d   Saoudi, Bachir ^b   Pintassilgo, Carlos D ^a,c   Loureiro, Jorge ^a   Moisan, Michel ^b  

^a INSTITUTO SUPERIOR TÉCNICO   (Portugal)

^b UNIVERSITÉ DE MONTRÉAL   (Canada)

^c UNIVERSITY OF PORTO   (Portugal)

^d INSTITUTE OF EXPERIMENTAL MEDICINE   (Hungary)

Author keywords

Afterglow plasma processes; Density; Hydrodynamic modelling; Kinetics; Microwave discharges; Sterilization; UV irradiation

Indexed keywords

FLUID DYNAMICS; HYDRODYNAMICS; IRRADIATION; MICROWAVE IRRADIATION; MICROWAVES; ORGANIC POLYMERS; PLASMAS; SIZE DISTRIBUTION; STERILIZATION (CLEANING); THREE DIMENSIONAL;

AFTERGLOW PLASMA PROCESSES; DENSITY; HYDRODYNAMIC MODELLING; KINETICS; MICROWAVE DISCHARGES; STERILIZATION; UV IRRADIATION;

ELECTRIC DISCHARGES;

EID: 60049085603     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200800085     Document Type: Article

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