Effect of nitrogen flow ratios on the microstructure and properties of (TiVCr)N coatings by reactive magnetic sputtering

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 269, Issue 7, 2011, Pages 685-691

  Tsai, Du Cheng ^a   Huang, Yen Lin ^a   Lin, Sheng Ru ^a   Jung, De Ru ^a   Shieu, Fuh Sheng ^a  

^a NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

(TiVCr)N coatings; Hardness; Magnetron sputtering; Nitrides; Structure; Thin film

Indexed keywords

(TIVCR)N COATINGS; BODY-CENTERED CUBIC; DC REACTIVE MAGNETRON SPUTTERING; DENSE COLUMNAR STRUCTURES; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL RESISTIVITY; FACE-CENTERED CUBIC; FLOW RATIOS; GRAIN SIZE; GROWTH CONDITIONS; MICROSTRUCTURE AND PROPERTIES; NITRIDE COATING; NITROGEN FLOW; PREFERRED ORIENTATIONS; REACTIVE MAGNETIC SPUTTERING; SOLUTION STRUCTURES; STRUCTURE;

CRYSTAL MICROSTRUCTURE; ELECTRIC CONDUCTIVITY; HARDENING; HARDNESS; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; NITRIDES; OPTICAL PROPERTIES; THIN FILMS;

COATINGS;

EID: 79952441486     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2011.01.127     Document Type: Article

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