Influence of N2 partial pressure on mechanical properties of (Ti,Al)N films deposited by reactive magnetron sputtering

Vacuum

Volumn 83, Issue 7, 2009, Pages 1057-1059

  Zhou, Tao ^a   Nie, Pulin ^a   Cai, Xun ^a   Chu, Paul K ^b  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

(Ti,Al)N; Film; Mechanical properties; N2 partial pressure

Indexed keywords

ALUMINUM; CRYSTAL ORIENTATION; ELASTIC MODULI; ELECTRODEPOSITION; HARDNESS; MAGNETRONS; METALLIC FILMS; PARTIAL PRESSURE;

(TI,AL)N; DC REACTIVE MAGNETRON SPUTTERING; ENERGY DISPERSIVE X-RAY SPECTROSCOPIES; FILM HARDNESS; GLANCING ANGLE X-RAY DIFFRACTIONS; GRAIN SIZES; MAXIMUM HARDNESS; MOSAIC TARGETS; N2 PARTIAL PRESSURE; NANO-INDENTATION TESTS; NITROGEN PARTIAL PRESSURES; PREFERENTIAL ORIENTATIONS; REACTIVE MAGNETRON SPUTTERING; SUBSTRATE BIAS;

MECHANICAL PROPERTIES;

EID: 61849179811     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2009.01.001     Document Type: Article

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