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Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 268, Issue 16, 2010, Pages 2504-2509

Characteristics of TiVCrAlZr multi-element nitride films prepared by reactive sputtering

(5) Chang, Zue Chin a Liang, Shih Chang b Han, Sheng c Chen, Yi Kun d Shieu, Fuh Sheng b

a NATIONAL CHIN YI UNIVERSITY OF TECHNOLOGY (Taiwan)

b NATIONAL CHUNG HSING UNIVERSITY (Taiwan)

c NATIONAL TAICHUNG UNIVERSITY OF SCIENCE AND TECHNOLOGY (Taiwan)

d CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY (Taiwan)

Author keywords

Face center cubic solid solution; Multi element alloy; Radio frequency magnetron sputtering

Indexed keywords

ALLOY FILM; AMORPHOUS STRUCTURES; FLOW RATIOS; FRACTURE FEATURE; HARDNESS AND ELASTIC MODULUS; MAXIMUM VALUES; MULTI-ELEMENT; MULTI-ELEMENT ALLOY; NITRIDE FILMS; NITROGEN FLOW; RADIO-FREQUENCY-MAGNETRON SPUTTERING; REACTIVE RADIO-FREQUENCY MAGNETRON SPUTTERING; SILICON SUBSTRATES; SMOOTH SURFACE;

ALLOYS; AMORPHOUS FILMS; ARGON; MAGNETRON SPUTTERING; NITRIDES; SEMICONDUCTING ALUMINUM COMPOUNDS; SOLID SOLUTIONS; TERNARY SYSTEMS;

FILM PREPARATION;

EID: 77955303457 PISSN: 0168583X EISSN: None Source Type: Journal
DOI: 10.1016/j.nimb.2010.05.039 Document Type: Article

Times cited : (74)

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