Temperature threshold for nanorod structuring of metal and oxide films grown by glancing angle deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 29, Issue 1, 2011, Pages

  Deniz, Derya ^a   Lad, Robert J ^a  

^a UNIVERSITY OF MAINE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADATOM MOBILITIES; ELEMENTAL METALS; FILM MORPHOLOGY; GLANCING ANGLE DEPOSITION; HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPIES; NANO-STRUCTURING; NANOROD MORPHOLOGIES; NUCLEATION AND GROWTH; PULSED DC MAGNETRON SPUTTERING; ROOM TEMPERATURE; ROTATION RATE; RUTHENIUM DIOXIDE; SUBSTRATE ROTATION; TEMPERATURE RANGE; TEMPERATURE THRESHOLDS; TUNGSTEN TRIOXIDE;

ADATOMS; FILM GROWTH; GOLD; GOLD DEPOSITS; HIGH RESOLUTION ELECTRON MICROSCOPY; METALS; MORPHOLOGY; NANORODS; ROTATION; RUTHENIUM; RUTHENIUM ALLOYS; RUTHENIUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; TIN; TIN DIOXIDE; TUNGSTEN; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

OXIDE FILMS;

EID: 79952011292     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3525882     Document Type: Article

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