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Journal of Applied Physics

Volumn 107, Issue 8, 2010, Pages

Power law scaling during physical vapor deposition under extreme shadowing conditions

(2) Mukherjee, S a Gall, D a

a RENSSELAER POLYTECHNIC INSTITUTE (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC SHADOWING; CRITICAL VALUE; DEPOSITION TEMPERATURES; EXPERIMENTAL VALIDATIONS; GLANCING ANGLE; GROWTH EXPONENT; GROWTH FRONT; LINEAR DEPENDENCE; METALLIC SYSTEMS; MORPHOLOGICAL EVOLUTION; P-VALUES; POWER LAW SCALINGS; QUALITATIVE MODEL; QUANTITATIVE AGREEMENT; TEMPERATURE DEPENDENCE; THREE-DIMENSIONAL ISLAND GROWTH;

CHROMIUM; CONTROL RODS; NANORODS; PHYSICAL VAPOR DEPOSITION; SURFACE ROUGHNESS; TANTALUM;

TWO DIMENSIONAL;

EID: 77952348767 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3385389 Document Type: Article

Times cited : (28)

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