Nanostructured tungsten and tungsten trioxide films prepared by glancing angle deposition

Thin Solid Films

Volumn 518, Issue 15, 2010, Pages 4095-4099

  Deniz, Derya ^a   Frankel, David J ^a   Lad, Robert J ^a  

^a UNIVERSITY OF MAINE   (United States)

Author keywords

Glancing angle deposition; Nanorods; Pulsed DC sputtering; Scanning electron microscopy; Tungsten trioxide; X ray photoelectron spectroscopy

Indexed keywords

AMORPHOUS STRUCTURES; AR PLASMAS; CHEMICAL COMPOSITIONS; FILM STRUCTURE; FILM/SUBSTRATE INTERFACE; GAS SENSORS; GLANCING ANGLE DEPOSITION; HIGH SURFACE AREA; HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPIES; INDUCED CRYSTALLIZATION; MORPHOLOGICAL CHANGES; NANO-STRUCTURED; NANOPOROUS NETWORKS; NANOROD MORPHOLOGIES; NANOSTRUCTURED FILMS; NANOSTRUCTURED MORPHOLOGY; POLYCRYSTALLINE; POST DEPOSITION ANNEALING; PULSED DC SPUTTERING; PULSED DIRECT CURRENT; RANDOM GRAINS; ROOM TEMPERATURE; SIMPLE CUBIC; SUBSTRATE ROTATION; TUNGSTEN TRIOXIDE;

AMORPHOUS MATERIALS; ANNEALING; ELECTRONS; FILM PREPARATION; HIGH RESOLUTION ELECTRON MICROSCOPY; MORPHOLOGY; NANORODS; PHASE INTERFACES; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; SCANNING; SCANNING ELECTRON MICROSCOPY; TUNGSTEN; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAYS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 77953151224     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.10.153     Document Type: Article

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