Characterization of pulsed laser deposited WO3 thin films for electrochromic devices

Applied Surface Science

Volumn 153, Issue 1, 1999, Pages 1-9

  Rougier, A ^a   Portemer, F ^c   Quede A ^a   El Marssi, M ^b  

^a UNIVERSITÉ DE PICARDIE JULES VERNE   (France)

^b Universite de Picardie Jules Verne   (France)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; CRYSTALLIZATION; DEPOSITION; ELECTROCHROMISM; ENERGY GAP; MORPHOLOGY; PRESSURE EFFECTS; PULSED LASER APPLICATIONS; THERMAL EFFECTS; THIN FILMS; TUNGSTEN COMPOUNDS;

TUNGSTEN OXIDE;

OPTICAL FILMS;

EID: 0033317557     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00335-9     Document Type: Article

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