Temperature-induced chaos during nanorod growth by physical vapor deposition

Journal of Applied Physics

Volumn 105, Issue 9, 2009, Pages

  Mukherjee, S ^a   Zhou, C M ^a   Gall, D ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALL METAL; ATOMIC SHADOWING; CHAOTIC INSTABILITY; CURVED SURFACES; EFFECTIVE MASS; ELEMENTAL METALS; GLANCING ANGLE DEPOSITION; LAYER MORPHOLOGY; MEAN FIELD; MODEL-BASED; NANOROD GROWTH; NUCLEATION THEORY; SINGLE CURVES; TEMPERATURE-INDUCED; THREE-DIMENSIONAL GROWTH;

MELTING POINT; MORPHOLOGY; NANORODS; SMELTING; SURFACE DIFFUSION; VAPOR DEPOSITION; VAPORS;

ACTIVATION ENERGY;

EID: 67249157485     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3116720     Document Type: Article

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