Investigation of substrate rotation at glancing incidence on thin-film morphology

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2569-2575

  Dick, B ^a   Brett, M J ^a   Smy, T ^b  

^a UNIVERSITY OF ALBERTA   (Canada)

^b CARLETON UNIVERSITY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYST ACTIVITY; CRYSTAL STRUCTURE; DEPOSITION; DIFFUSION IN SOLIDS; EVAPORATION; MELTING; MICROSTRUCTURE; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PRESSURE EFFECTS; ROTATION; SCANNING ELECTRON MICROSCOPY; SILICA; SUBSTRATES; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY;

FACETTED STRUCTURES; GLANCING ANGLE DEPOSITION (GLAD); ROTATIONAL SPEED;

THIN FILMS;

EID: 0942289262     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1627334     Document Type: Article

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