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Journal of the Electrochemical Society

Volumn 158, Issue 1, 2011, Pages

Impact of top (Pt, Au, and Al) electrodes on HfAl Ox -based MIM capacitors

(5) Hota, M K a,b Mahata, C a Mallik, S a Sarkar, C K b Maiti, C K a

a INDIAN INSTITUTE OF TECHNOLOGY (India)

b JADAVPUR UNIVERSITY (India)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURES; BOTTOM ELECTRODES; CAPACITANCE VOLTAGE CHARACTERISTIC; CHEMICAL COMPOSITIONS; CONDUCTION MECHANISM; CURRENT VOLTAGE; DEPOSITED FILMS; ELECTRICAL AND DIELECTRIC PROPERTIES; ELECTRICAL CHARACTERIZATION; FORMING METALS; FREQUENCY RANGES; GRAZING INCIDENCE X-RAY DIFFRACTION STUDIES; HIGH FIELD; LOW FIELD; MIM CAPACITORS; POOLE-FRENKEL MECHANISMS; RADIO-FREQUENCY MAGNETRON CO-SPUTTERING; ROOT MEAN SQUARE VALUES; SCHOTTKY EMISSIONS; STRESS VOLTAGES; VOLTAGE COEFFICIENT OF CAPACITANCES; VOLTAGE COEFFICIENTS OF CAPACITANCES;

ALUMINUM; AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CAPACITANCE; CAPACITORS; DIELECTRIC PROPERTIES; ELECTRODES; ENERGY DISSIPATION; HAFNIUM; MAGNETRONS; METAL INSULATOR BOUNDARIES; MIM DEVICES; PLATINUM; SURFACE ROUGHNESS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

CURRENT VOLTAGE CHARACTERISTICS;

EID: 79951969794 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.3514656 Document Type: Article

Times cited : (9)

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