Electrical properties of Ta2O5 films obtained by plasma enhanced chemical vapor deposition using a TaF5 source

Applied Physics Letters

Volumn 68, Issue 13, 1996, Pages 1775-1777

  Devine, R A B ^a   Vallier, L ^a   Autran, J L ^b   Paillet, P ^b   Leray, J L ^b  

^a ORANGE LABS   (France)

^b CEA DIF   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000102577     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116663     Document Type: Article

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