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Volumn 23, Issue 6, 2002, Pages 345-347

A capacitorless double-gate DRAM cell

Author keywords

Double gate MOSFETs; DRAM; Fully depleted; Scaled CMOS; Silicon on insulator (SOI) MOSFETs

Indexed keywords

CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; CURRENT VOLTAGE CHARACTERISTICS; GATES (TRANSISTOR); IMPACT IONIZATION; MOSFET DEVICES; SILICON ON INSULATOR TECHNOLOGY; THRESHOLD VOLTAGE;

EID: 0036610025     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2002.1004230     Document Type: Letter
Times cited : (81)

References (17)
  • 8
    • 0032679692 scopus 로고    scopus 로고
    • Silicon nanoelectronics for the 21st century
    • (1999) Nanotechnology , Issue.10 , pp. 113-116
    • Hu, C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.