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Volumn 26, Issue 3, 2011, Pages 542-549

Quantitative depth profiling of boron and arsenic ultra low energy implants by pulsed rf-GD-ToFMS

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTICAL CHARACTERIZATION; CALIBRATION PROCEDURE; CRITICAL EVALUATION; DEPTH PROFILE; DEPTH RESOLUTION; GRAZING INCIDENCE; ION DOSE; ION ENERGIES; MATRIX; MULTI-LAYERED; NANOMETRES; PULSED GLOW DISCHARGE; QUALITATIVE ANALYSIS; QUANTITATIVE DEPTH PROFILING; RADIO FREQUENCIES; REFERENCE TECHNIQUE; TIME OF FLIGHT MASS SPECTROMETRY; ULTRALOW ENERGY; X RAY FLUORESCENCE;

EID: 79951873343     PISSN: 02679477     EISSN: 13645544     Source Type: Journal    
DOI: 10.1039/c0ja00197j     Document Type: Article
Times cited : (20)

References (30)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.