Quantitative depth profile analysis of boron implanted silicon by pulsed radiofrequency glow discharge time-of-flight mass spectrometry

Solar Energy Materials and Solar Cells

Volumn 94, Issue 8, 2010, Pages 1352-1357

  Pisonero, J ^a   Lobo, L ^a   Bordel, N ^a   Tempez, A ^b   Bensaoula, A ^c   Badi, N ^c   Sanz Medel, A ^a  

^a UNIVERSITY OF OVIEDO   (Spain)

^b HORIBA LTD   (Japan)

^c University of Houston   (United States)

Author keywords

Boron mass content; Depth profile; Doped silicon; Glow discharge; Mass spectrometry; Multi crystalline and monocrystalline silicon

Indexed keywords

DEPTH PROFILE; DOPED SILICON; GLOW DISCHARGE MASS SPECTROMETRY; MASS CONTENT; MONOCRYSTALLINE SILICON; MULTI-CRYSTALLINE AND MONOCRYSTALLINE SILICON;

BORON; CALIBRATION; CRYSTALLINE MATERIALS; DOPING (ADDITIVES); GLOW DISCHARGES; MASS SPECTROMETERS; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON COMPOUNDS; SPECTROMETRY;

SILICON WAFERS;

EID: 77953323740     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2010.04.002     Document Type: Article

References (15)

1. Pisonero J., Fernandez B., and Günther D. Critical revision of GD-MS, LA-ICP-MS and SIMS as inorganic mass spectrometric techniques for direct solid analysis. J. Anal. At. Spectrom. 24 (2009) 1145-1160
2. Vickerman J.C. Surface Analysis-The Principal Techniques (1998), Wiley, Chichester, pp.135-214
3. Pisonero J., Kroslakova I., Günther D., and Latkoczy C. Laser ablation inductively coupled plasma mass spectrometry for direct analysis of the spatial distribution of trace elements in metallurgical-grade silicon. Anal. Bioanal. Chem. 386 (2006) 12-20
4. Pisonero J., Fernández B., Pereiro R., Bordel N., and Sanz-Medel A A. Glow-discharge spectrometry for direct analysis of thin and ultra-thin solid films. Trends Anal. Chem. 25 (2006) 11-18
5. Beyer C., Feldmann I., Gilmour D., Hoffmann V., and Jakuboswki N. Development and characterization of a Grimm-type glow discharge ion source operated with high gas flow rates and coupled to a mass spectrometer with high mass resolution. Spectrom. Acta Part B 57 (2002) 1521-1533
6. Putyera K., Su K., Liu C., Hockett R.S., and Wang L. Quantitative measurement of boron and phosphorous in solar grade silicon feedstocks by high resolution fast-flow glow discharge mass spectrometry. Mater. Res. Soc. Symp. Proc 1123 (2009) P01-P08
7. Pisonero J. Glow discharge spectroscopy for depth profile analysis: from micrometer to sub-nanometer layers. Anal. Bioanal. Chem. 384 (2006) 47-49
8. Valledor R., Pisonero J., Bordel N., Martin J.I., Quiros C., Tempez A., and Sanz-Medel A. Direct chemical in-depth profile analysis and thickness quantification of nanometer multilayers using pulsed-rf-GD-TOFMS. Anal. Bioanal. Chem. 396 (2010) 2881-2887
9. Lobo L., Pisonero J., Bordel N., Pereiro R., Tempez A., Chapon P., Michler J., Hohle M., and Sanz-Medel A. A comparison of non-pulsed radiofrequency and pulsed radiofrequency glow discharge orthogonal time-of-flight mass spectrometry for analytical purposes. J. Anal. At. Spectrom. 24 (2009) 1373-1381
10. Hohl M., Kanzari A., Michler J., Nelis Th., Fuhrer K., and Gonin M. Pulsed r.f.-glow-discharge time-of-flight mass spectrometry for fast surface and interface analysis of conductive and non-conductive materials. Surf. Interface Anal. 38 (2006) 292-295
11. Muñiz A.C., Pisonero J., Lobo L., Gonzalez C., Bordel N., Pereiro R., Tempez A., Chapon P., Tuccitto N., Licciardello A., and Sanz-Medel A. Pulsed radiofrequency glow discharge time of flight mass spectrometer for the direct analysis of bulk and thin coated glasses. J. Anal. At. Spectrom. 23 (2008) 1239-1246
12. Molchan I.S., Thompson G.E., Skeldon P., Trigoulet N., Chapon P., Tempez A., Malherbe J., Lobo Revilla L., Bordel N., Belenguer Ph., Nelis T., Zahri A., Therese L., Guillot Ph., Ganciu M., Milcher J., and Hohl M. The concept of plasma cleaning in glow discharge spectrometry. J. Anal. At. Spectrom. 24 (2009) 734-741
13. Majidi V., Moser M., Lewis C., Hang W., and King F.L. Explicit chemical speciation by microsecond pulsed glow discharge time-of-flight mass spectrometry: concurrent acquisition of structural, molecular and elemental information. J. Anal. At. Spectrom. 15 (2000) 19-25
14. A. Tempez, N. Bordel, M. Hohl, A. Menendez, L. Lobo, J. Orphal, C. Diplasu, A. Surmeian, M. Ganciu, T. Nakamura, Ionization processes in a Grimm type source used in pulsed r.f.-glow-discharge time-of- flight mass spectrometry, in: Proceedings of the 18th International Symposium on Plasma Chemistry, Kyoto, Japan, August 26-31 (2007).
15. A. Menéndez, PhD Thesis, Descargas Luminiscentes Acopladas a Espectrometría Óptica y de Masas en el Análisis de Semiconductores, Óxidos y Nitruros, University of Oviedo, 2006.