Radiofrequency glow discharge-optical emission spectrometry for the analysis of metallurgical-grade silicon

Journal of Analytical Atomic Spectrometry

Volumn 20, Issue 3, 2005, Pages 233-235

  Menéndez, Armando ^a   Bordel, Nerea ^a   Pereiro, Rosario ^a   Sanz Medel, Alfredo ^a  

^a UNIVERSITY OF OVIEDO   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

BINDERS; CHEMICAL ANALYSIS; CONTAMINATION; EMISSION SPECTROSCOPY; FURNACES; GLOW DISCHARGES; INDUCTIVELY COUPLED PLASMA; METALLURGY; PROBLEM SOLVING; RISK PERCEPTION; SEMICONDUCTOR MATERIALS; SPUTTERING; TRACE ANALYSIS; ZIRCONIA;

DIRECT CURRENT (DC); METALLURGICAL-GRADE SILICON; OPTICAL EMISSION SPECTROMETRY (OES); RADIOFREQUENCY (RF);

SILICON WAFERS;

EID: 15244349030     PISSN: 02679477     EISSN: None     Source Type: Journal    
DOI: 10.1039/b416166a     Document Type: Article

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