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Journal of Vacuum Science and Technology B

Volumn 29, Issue 1, 2011, Pages

Temperature dependence of TaAlOx metal-insulator-metal capacitors

(4) Hota, M K a Mallik, S a Sarkar, C K b Maiti, C K a

a INDIAN INSTITUTE OF TECHNOLOGY (India)

b JADAVPUR UNIVERSITY (India)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM COATINGS; ALUMINUM OXIDE; CAPACITANCE; CRYSTALLINITY; DIELECTRIC LOSSES; GOLD COMPOUNDS; GOLD DEPOSITS; HIGH-K DIELECTRIC; MAGNETRON SPUTTERING; METAL INSULATOR BOUNDARIES; METALS; OXIDE FILMS; SEMICONDUCTOR INSULATOR BOUNDARIES; TANTALUM OXIDES; TEMPERATURE DISTRIBUTION; X RAY POWDER DIFFRACTION;

ANNEALING TEMPERATURES; FREQUENCY DEPENDENCE; GRAZING INCIDENCE X-RAY DIFFRACTION ANALYSIS; METAL INSULATOR METAL CAPACITOR (MIM); RF-MAGNETRON SPUTTERING; STRUCTURAL AND ELECTRICAL PROPERTIES; TEMPERATURE COEFFICIENT OF CAPACITANCE; TEMPERATURE DEPENDENCE;

MIM DEVICES;

EID: 79551617343 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3535558 Document Type: Conference Paper

Times cited : (3)

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