Formation of Ge-nanocrystals in SiO2 matrix by magnetron sputtering and post-deposition thermal treatment

Superlattices and Microstructures

Volumn 44, Issue 4-5, 2008, Pages 323-330

  Desnica, U V ^a   Salamon, K ^b   Buljan, M ^a   Dubcek, P ^a   Radic, N ^a   Desnica Frankovic, I D ^a   Siketic, Z ^a   Bogdanovic Radovic, I ^a   Ivanda, M ^a   Bernstorff, S ^c  

^a RUDER BO KOVI INSTITUTE   (Croatia)

^b INSTITUTE OF PHYSICS   (Croatia)

^c SINCROTRONE TRIESTE   (Italy)

Author keywords

GISAXS; Magnetron sputtering; Nanocrystals; Quantum dots; Raman; RBS

Indexed keywords

GERMANIUM; QUANTUM ELECTRONICS; SILICON COMPOUNDS;

GISAXS; MAGNETRON SPUTTERING; NANOCRYSTALS; QUANTUM DOTS; RAMAN; RBS;

SEMICONDUCTOR QUANTUM DOTS;

EID: 53849112292     PISSN: 07496036     EISSN: 10963677     Source Type: Journal    
DOI: 10.1016/j.spmi.2008.01.021     Document Type: Article

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