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Volumn 83, Issue 3, 2011, Pages

Electronic structure study of ion-implanted Si quantum dots in a SiO 2 matrix: Analysis of quantum confinement theories

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EID: 79551578646     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.83.035112     Document Type: Article
Times cited : (50)

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    • 2; therefore, it may not properly account for any possible shift in the Si 2p peak. However, if we look at the shift in C 1s and Si 2p, we see that all peaks shift by the same amount, within experimental error; see Tables II and III. If our correction method is overcompensating for the shift in the peak, we should still expect to see differences from sample to sample.
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