High temperature oxidation behavior of CrN/AlN superlattice films

Thin Solid Films

Volumn 519, Issue 8, 2011, Pages 2402-2408

  Lin, Jianliang ^a   Moore, John J ^a   Wang, Jun ^a   Sproul, William D ^a,b  

^a Department of Metallurgical and Materials Engineering   (United States)

^b Reactive Sputtering INC   (United States)

Author keywords

CrAlN; CrN AlN; Multilayer film; Oxidation resistance; Superlattice coating; Thermal stability

Indexed keywords

ALN LAYERS; AMBIENT AIR; BILAYER PERIOD; CLOSED FIELD UNBALANCED MAGNETRON SPUTTERING SYSTEMS; CRALN; CRN/ALN; CRYSTAL PHASE; CRYSTALLINE OXIDES; CUBIC STRUCTURE; ELEVATED TEMPERATURE; HEXAGONAL STRUCTURES; HIGH TEMPERATURE OXIDATION BEHAVIOR; OXIDATION BEHAVIORS; OXIDATION TEMPERATURE; OXIDATION TESTS; PULSED DC; SUPER-LATTICE FILMS; SUPER-LATTICE STRUCTURES; SUPERLATTICE COATING; THERMAL STABILITY; WURZITE; X-RAY AMORPHOUS;

ALUMINUM; AMORPHOUS FILMS; CHROMIUM COMPOUNDS; COATINGS; CRYSTAL MICROSTRUCTURE; CRYSTALLINE MATERIALS; MULTILAYER FILMS; MULTILAYERS; NANOINDENTATION; OXIDATION RESISTANCE; SCANNING ELECTRON MICROSCOPY; SODIUM CHLORIDE; SUPERLATTICES; THERMODYNAMIC STABILITY; X RAY DIFFRACTION;

OXIDATION;

EID: 79551494430     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.11.042     Document Type: Article

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