-
1
-
-
0019633490
-
Oxidation kinetics of TiN thin films
-
Wittmer, M., Noser, J. and Melchior, H., Oxidation kinetics of TiN thin films. J. Appl. Phys., 1981, 52, 6659-6664.
-
(1981)
J. Appl. Phys.
, vol.52
, pp. 6659-6664
-
-
Wittmer, M.1
Noser, J.2
Melchior, H.3
-
2
-
-
0007636099
-
-
Suni, F., Sigurd, D., Ho, K. T. and Nicolet, M. A., J. Electrochem. Soc., 1983, 130, 121.
-
(1983)
J. Electrochem. Soc.
, vol.130
, pp. 121
-
-
Suni, F.1
Sigurd, D.2
Ho, K.T.3
Nicolet, M.A.4
-
3
-
-
13944274472
-
0.5N films: Kinetics and mechanisms
-
0.5N films: kinetics and mechanisms. J. Appl. Phys., 1990, 67, 1542-1553.
-
(1990)
J. Appl. Phys.
, vol.67
, pp. 1542-1553
-
-
McIntyre, D.1
Greene, J.E.2
Hakansson, G.3
Sundgren, J.E.4
Munz, W.D.5
-
4
-
-
0023136972
-
Industrial deposition of binary, ternary and quaternary nitrides of titanium, zirconium and aluminum
-
Knotek, O., Münz, W. D. and Leyendecker, T., Industrial deposition of binary, ternary and quaternary nitrides of titanium, zirconium and aluminum. J. Vac. Sci. Technol., 1987, A5, 2173-2179.
-
(1987)
J. Vac. Sci. Technol.
, vol.A5
, pp. 2173-2179
-
-
Knotek, O.1
Münz, W.D.2
Leyendecker, T.3
-
5
-
-
0024036421
-
Selective oxidation and chemical state of Al and Ti in (Ti,Al)N coatings
-
Hofmann, S. and Jehn, H. A., Selective oxidation and chemical state of Al and Ti in (Ti,Al)N coatings. Surf. Interf. Anal., 1988, 12, 329-333.
-
(1988)
Surf. Interf. Anal.
, vol.12
, pp. 329-333
-
-
Hofmann, S.1
Jehn, H.A.2
-
7
-
-
0023435633
-
Surface and interface characterization of heat treated (Ti,Al) coating on high speed steel substrates
-
W. D.
-
Jehn, H. A., Hofmann, S. and W. D., Surface and interface characterization of heat treated (Ti,Al) coating on high speed steel substrates. Thin Solid Films, 1987, 153, 45-53.
-
(1987)
Thin Solid Films
, vol.153
, pp. 45-53
-
-
Jehn, H.A.1
Hofmann, S.2
-
8
-
-
0025593573
-
Formation and diffusion properties of oxide films on metals and on nitride coatings studied with Auger electron spectroscopy and x-ray photoelectron spectroscopy
-
Hofmann, S., Formation and diffusion properties of oxide films on metals and on nitride coatings studied with Auger electron spectroscopy and X-ray photoelectron spectroscopy. Thin Solid Films, 1990, 193/194, 648-664.
-
(1990)
Thin Solid Films
, vol.193-194
, pp. 648-664
-
-
Hofmann, S.1
-
9
-
-
0029544880
-
Oxidation behaviour of titanium-aluminium nitrides
-
Joshi, A. and Hu, H. S., Oxidation behaviour of titanium-aluminium nitrides. Surf. Coat. Technol., 1995, 76-77, 499-507.
-
(1995)
Surf. Coat. Technol.
, vol.76-77
, pp. 499-507
-
-
Joshi, A.1
Hu, H.S.2
-
10
-
-
0040556446
-
Oxidation resistance of (Ti,Al,Zr,Si)N coatings in air
-
Rebouta, L., Vaz, F., Andritschky, M. and da Silva, M. F., Oxidation resistance of (Ti,Al,Zr,Si)N coatings in air. Surf. Coat. Technol., 1995, 76-77, 70-74.
-
(1995)
Surf. Coat. Technol.
, vol.76-77
, pp. 70-74
-
-
Rebouta, L.1
Vaz, F.2
Andritschky, M.3
Da Silva, M.F.4
-
11
-
-
0025792680
-
Phase formation and characterization of hard coatings in the Ti-AI-N system prepared by the cathodic arc ion plating method
-
Ikeda, T. and Satoh, H., Phase formation and characterization of hard coatings in the Ti-AI-N system prepared by the cathodic arc ion plating method. Thin Solid Films, 1991, 195, 99-110.
-
(1991)
Thin Solid Films
, vol.195
, pp. 99-110
-
-
Ikeda, T.1
Satoh, H.2
-
12
-
-
0022075813
-
Algorithms for the rapid simulation of Rutherford backscattering spectra
-
Doolittle, L. R., Algorithms for the rapid simulation of Rutherford backscattering spectra. Nucl. Inst. and Meth., 1985, B9, 344-351.
-
(1985)
Nucl. Inst. and Meth.
, vol.B9
, pp. 344-351
-
-
Doolittle, L.R.1
-
13
-
-
0027589685
-
x)N films prepared by reactive sputtering
-
x)N films prepared by reactive sputtering. Thin Solid Films, 1993, 228, 238-241.
-
(1993)
Thin Solid Films
, vol.228
, pp. 238-241
-
-
Tanaka, Y.1
Gur, T.M.2
Kelly, M.3
Hagstrom, S.B.4
Ikeda, T.5
-
14
-
-
0039979692
-
-
Academic Press, New York
-
Chu, W. K., Mayer, J. W. and Nicolet, M. A., Rutherford Backcattering Spectroscopy. Academic Press, New York, 1978, p. 108.
-
(1978)
Rutherford Backcattering Spectroscopy
, pp. 108
-
-
Chu, W.K.1
Mayer, J.W.2
Nicolet, M.A.3
-
17
-
-
0020778679
-
-
Lavrenko, V. A. and Alexeev, A. F., Ceram. Int., 1983, 9, 80.
-
(1983)
Ceram. Int.
, vol.9
, pp. 80
-
-
Lavrenko, V.A.1
Alexeev, A.F.2
-
18
-
-
36449001763
-
Titanium nitride oxidation chemistry: An x-ray photoelectron spectroscopy study
-
Saha, N. C. and Tompkins, H. G., Titanium nitride oxidation chemistry: an x-ray photoelectron spectroscopy study. J. Appl. Phys., 1992, 72, 3072-3079.
-
(1992)
J. Appl. Phys.
, vol.72
, pp. 3072-3079
-
-
Saha, N.C.1
Tompkins, H.G.2
-
19
-
-
0025505426
-
Characterization of titanium nitride thin films
-
Wu, H. Z., Chou, T. C., Mishra, A., Anderson, D. R., Lampert, J. K. and Gujrathi, S. C., Characterization of titanium nitride thin films. Thin Solid Films, 1990, 191, 55-67.
-
(1990)
Thin Solid Films
, vol.191
, pp. 55-67
-
-
Wu, H.Z.1
Chou, T.C.2
Mishra, A.3
Anderson, D.R.4
Lampert, J.K.5
Gujrathi, S.C.6
-
20
-
-
0042347280
-
Magnetron sputtered TiAlON composite thin films I: Structure and morphology
-
Luthier, R. and Lévy, F., Magnetron sputtered TiAlON composite thin films I: structure and morphology. J. Vac. Sci. Technol., 1991, A9, 102-109.
-
(1991)
J. Vac. Sci. Technol.
, vol.A9
, pp. 102-109
-
-
Luthier, R.1
Lévy, F.2
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