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Volumn 17, Issue 15-16, 1997, Pages 1971-1977

Thermal oxidation of Ti1-xAlxN coatings in air

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EID: 0001517674     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0955-2219(97)00050-2     Document Type: Article
Times cited : (141)

References (20)
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  • 4
    • 0023136972 scopus 로고
    • Industrial deposition of binary, ternary and quaternary nitrides of titanium, zirconium and aluminum
    • Knotek, O., Münz, W. D. and Leyendecker, T., Industrial deposition of binary, ternary and quaternary nitrides of titanium, zirconium and aluminum. J. Vac. Sci. Technol., 1987, A5, 2173-2179.
    • (1987) J. Vac. Sci. Technol. , vol.A5 , pp. 2173-2179
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  • 5
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    • Selective oxidation and chemical state of Al and Ti in (Ti,Al)N coatings
    • Hofmann, S. and Jehn, H. A., Selective oxidation and chemical state of Al and Ti in (Ti,Al)N coatings. Surf. Interf. Anal., 1988, 12, 329-333.
    • (1988) Surf. Interf. Anal. , vol.12 , pp. 329-333
    • Hofmann, S.1    Jehn, H.A.2
  • 7
    • 0023435633 scopus 로고
    • Surface and interface characterization of heat treated (Ti,Al) coating on high speed steel substrates
    • W. D.
    • Jehn, H. A., Hofmann, S. and W. D., Surface and interface characterization of heat treated (Ti,Al) coating on high speed steel substrates. Thin Solid Films, 1987, 153, 45-53.
    • (1987) Thin Solid Films , vol.153 , pp. 45-53
    • Jehn, H.A.1    Hofmann, S.2
  • 8
    • 0025593573 scopus 로고
    • Formation and diffusion properties of oxide films on metals and on nitride coatings studied with Auger electron spectroscopy and x-ray photoelectron spectroscopy
    • Hofmann, S., Formation and diffusion properties of oxide films on metals and on nitride coatings studied with Auger electron spectroscopy and X-ray photoelectron spectroscopy. Thin Solid Films, 1990, 193/194, 648-664.
    • (1990) Thin Solid Films , vol.193-194 , pp. 648-664
    • Hofmann, S.1
  • 9
    • 0029544880 scopus 로고
    • Oxidation behaviour of titanium-aluminium nitrides
    • Joshi, A. and Hu, H. S., Oxidation behaviour of titanium-aluminium nitrides. Surf. Coat. Technol., 1995, 76-77, 499-507.
    • (1995) Surf. Coat. Technol. , vol.76-77 , pp. 499-507
    • Joshi, A.1    Hu, H.S.2
  • 11
    • 0025792680 scopus 로고
    • Phase formation and characterization of hard coatings in the Ti-AI-N system prepared by the cathodic arc ion plating method
    • Ikeda, T. and Satoh, H., Phase formation and characterization of hard coatings in the Ti-AI-N system prepared by the cathodic arc ion plating method. Thin Solid Films, 1991, 195, 99-110.
    • (1991) Thin Solid Films , vol.195 , pp. 99-110
    • Ikeda, T.1    Satoh, H.2
  • 12
    • 0022075813 scopus 로고
    • Algorithms for the rapid simulation of Rutherford backscattering spectra
    • Doolittle, L. R., Algorithms for the rapid simulation of Rutherford backscattering spectra. Nucl. Inst. and Meth., 1985, B9, 344-351.
    • (1985) Nucl. Inst. and Meth. , vol.B9 , pp. 344-351
    • Doolittle, L.R.1
  • 18
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    • Titanium nitride oxidation chemistry: An x-ray photoelectron spectroscopy study
    • Saha, N. C. and Tompkins, H. G., Titanium nitride oxidation chemistry: an x-ray photoelectron spectroscopy study. J. Appl. Phys., 1992, 72, 3072-3079.
    • (1992) J. Appl. Phys. , vol.72 , pp. 3072-3079
    • Saha, N.C.1    Tompkins, H.G.2
  • 20
    • 0042347280 scopus 로고
    • Magnetron sputtered TiAlON composite thin films I: Structure and morphology
    • Luthier, R. and Lévy, F., Magnetron sputtered TiAlON composite thin films I: structure and morphology. J. Vac. Sci. Technol., 1991, A9, 102-109.
    • (1991) J. Vac. Sci. Technol. , vol.A9 , pp. 102-109
    • Luthier, R.1    Lévy, F.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.