Process structure properties relationship during formation of CrN and AlN layers on H13 Steel

Surface and Coatings Technology

Volumn 203, Issue 3-4, 2008, Pages 217-222

  Rojo, A ^a   Oseguera, J ^a   Salas, O ^a   Acosta, J A ^a  

^a SCHOOL OF ENGINEERING AND SCIENCES   (Mexico)

Author keywords

AlN; CrN; Plasma diagnostics; Reactive sputtering

Indexed keywords

CHROMIUM COMPOUNDS; DEPOSITION; LANGMUIR PROBES; MAGNETRONS; OPTICAL EMISSION SPECTROSCOPY; PLASMA DIAGNOSTICS; REACTIVE SPUTTERING; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

DEPOSITION METHODS; ENERGY DISPERSIVE X RAY MICROANALYSIS; ION DENSITY; MICRO-STRUCTURAL CHARACTERIZATION; OPTICAL EMISSION SPECTROSCOPIES (OES); PROCESS STRUCTURES; REACTIVE SYSTEM; SPECTRAL LINE;

PLASMA APPLICATIONS;

EID: 55049098581     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.08.045     Document Type: Article

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