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Volumn 248, Issue 2, 2011, Pages 323-326

Characterization of group II hafnates and zirconates for metal-insulator-metal capacitors

Author keywords

Dielectric thin films; High k capacitors; X ray absorption spectroscopy

Indexed keywords


EID: 79251516138     PISSN: 03701972     EISSN: 15213951     Source Type: Journal    
DOI: 10.1002/pssb.201046456     Document Type: Article
Times cited : (17)

References (27)
  • 1
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    • (1997)
    • Hori, T.1
  • 2
    • 84950309605 scopus 로고    scopus 로고
    • Dielectric Films for Advanced Microelectronics
    • in:, edited by M. Baklanov, M. Green, and K. Maex ( Wiley, Chichester, .
    • A. Toriumi and K. Kita, in: Dielectric Films for Advanced Microelectronics, edited by M. Baklanov, M. Green, and K. Maex ( Wiley, Chichester, 2007).
    • (2007)
    • Toriumi, A.1    Kita, K.2
  • 3
    • 50249175135 scopus 로고    scopus 로고
    • , DOI: 10.1109/IEDM.2007.4418854.
    • K. Kim and G. Jeong, IEDM Techn. Dig., 27 (2007), DOI: 10.1109/IEDM.2007.4418854.
    • (2007) IEDM Techn. Dig. , pp. 27
    • Kim, K.1    Jeong, G.2
  • 13
    • 33846175139 scopus 로고    scopus 로고
    • Materials for Information Technology, Devices, Interconnects and Packaging
    • in:, edited by E. Zschech, C. Whelan, and T. Mikolajick ( Springer, New York
    • D. Schmeißer, P. Hoffmann, and G. Beuckert, in: Materials for Information Technology, Devices, Interconnects and Packaging, edited by E. Zschech, C. Whelan, and T. Mikolajick ( Springer, New York, 2005), p. 449.
    • (2005) , pp. 449
    • Schmeißer, D.1    Hoffmann, P.2    Beuckert, G.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.