Dielectric and structural properties of thin SrHfO3 layers on TiN

Applied Physics Letters

Volumn 93, Issue 25, 2008, Pages

  Lupina, G ^a   Kozowski, G ^a   Dabrowski, J ^a   Dudek, P ^a   Lippert, G ^a   Mussig H J ^a  

^a IHP   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

LEAKAGE (FLUID); LEAKAGE CURRENTS; RAPID THERMAL ANNEALING; RAPID THERMAL PROCESSING; TIN; TITANIUM COMPOUNDS; TITANIUM NITRIDE;

AB INITIO CALCULATIONS; ANNEALING TREATMENTS; DIELECTRIC CONSTANTS; MEMORY CAPACITOR APPLICATIONS; POLYCRYSTAL LINES; VACANCYLIKE DEFECTS;

AMORPHOUS MATERIALS;

EID: 58149161402     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3049611     Document Type: Article

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