Photoreversible resists for UV nanoimprint lithography (UV-NIL)

ACS Applied Materials and Interfaces

Volumn 2, Issue 7, 2010, Pages 2076-2082

  Lin, Hong ^a   Wan, Xia ^a   Li, Zhongjie ^a   Jiang, Xuesong ^a   Wang, Qingkang ^a   Yin, Jie ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

photoreversible; UV nanoimprint lithography (UV NIL); UV curable resist

Indexed keywords

ACRYLATE GROUPS; CROSS-LINKED NETWORKS; CROSSLINKER; ETHYL ESTERS; PHOTODIMERIZATION; POINT LIGHT SOURCE; POLYMER NETWORKS; RADICAL POLYMERIZATION; ROOM TEMPERATURE; UV CURABLE; UV LIGHT; UV NANOIMPRINT LITHOGRAPHY;

CURING; ESTERS; LIGHT SOURCES;

NANOIMPRINT LITHOGRAPHY;

EID: 79151472503     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am100330s     Document Type: Article

References (32)

1. Guo, L. J. Adv. Mater. 2007, 19, 495-513
2. Long, B. K., Keitz, B. K., and Willson, C. G. J. Mater. Chem. 2007, 17, 3575-3580
3. Fuchs, A., Bender, M., Plachetaka, U., Kock, L., Koo, N., Wahlbrink, T., and Kuraz, H. Curr. Appl. Phys. 2008, 8, 669-674
4. Campos, L. M., Truong, T. T., Shim, D. E., Dimitriou, M. D., Shir, D., Meinel, I., Gerbec, J. A., Hahn, T. H., Rogers, J. A., and Hawker, C. J. Chem. Mater. 2009, 21, 5319-5326
5. Choi, K. M. J. Phys. Chem. B 2005, 109, 21525-21531
6. Khang, D. Y. and Lee, H. H. Langmuir 2004, 20, 2445-2448
7. Jung, G. Y., Wu, W., Li, Z., Chen, Z., Wang, S. Y., Tong, W. M., and Williams, R. S. Lagmuir 2005, 21, 1158-1161
8. Honda, Ko., Morita, M., and Takahara, A. Soft Mater. 2008, 4, 1400-1402
9. Kim, J. Y., Choi, D. G., Jeong, J. H., and Lee, E. S. Appl. Surf. Sci. 2008, 254, 4793-4796
10. Ogino, K., Chen, J. S., and Ober, C. K. Chem. Mater. 1998, 10, 3833-3838
11. Palmieri, F., Adams, J., Long, B., Heath, W., Tsiartas, P., and Willson, C. G. ACS Nano 2007, 1, 307-312
12. Willson, C. G. ACS Nano 2007, 1, 307-312
13. Heath, W. H., Palmieri, F., Adans, J. R., Long, B. K., Chute, J., Holcombe, T. W., Zieren, S., Truitt, M. J., White, J. L., and Willson, C. G. Macromolecules 2008, 41, 719-726
14. Kannurpatti, A. R., Anseth, J. W., and Bowman, C. N. Polymer 1998, 39, 2507-2513
15. Tsige, M., Lorenz, C. D., and Stevens, M. J. Macromolecules 2004, 37, 8466-8472
16. Lovestead, T. M., Berchtold, K. A., and Bowman, C. N. Macromolecules 2005, 38, 6374-6381
17. Colburn, M., Suez, I., More, A., and Willson, C. G. J. Vac. Sci. Technol., B: Microelectron. Nanometer Struct.-Process., Meas., Phenom. 2001, 19, 2685-2687
18. Dickey, M. D., Burns, R. L., Kim, E. K., Johnson, S. C., Stacey, N. A., and Willson, C. G. AlChE J. 2005, 51, 2547-2555
19. Ruckenstein, E. and Zhang, H. Macromolecules 1999, 32, 3979-3983
20. Ngai, T. and Wu, C. Macromolecules 2003, 36, 848-854
21. Guo, Z. X., Jiao, T. F., and Liu, M. H. Langmuir 2007, 23, 1824-1829
22. Fujiwara, M., Shiokawa, K., Kawasaki, N., and Tanka, Y. Adv. Funct. Mater. 2003, 13, 371-376
23. Muthuramu, K. and Ramamurthy, V. J. Org. Chem. 1982, 47, 3976-3979
24. Jung, G. Y., Li, Z. Y., Wu, W., Gannpathiappan, S., Li, X. M., Olynick, Deirdre, L., Wang, S. Y., and Williams, R. S. Langmuir 2005, 21, 6127-6130
25. Jung, G. Y., Gannpathiappan, S., Olynick, D. L., Chen, Y., and Williams, R. S. Nano Lett. 2004, 7, 1225-1229
26. Kim, E. K., Stacey, N. A., Smith, B. J., Dickey, M. D., Johnson, S. C., Trinque, B. C., and Willson, C. G. J. Vac. Sci. Technol., B: Microelectron. Nanometer Struct.-Process., Meas., Phenom. 2004, 22, 131-135
27. O'Brien, A. K. and Bowman, C. N. Macromolecules 2006, 39, 2501-2506
28. Biswal, D. and Hilt, J. Z. Macromolecules 2009, 42, 973-979
29. Bender, M., Otto, M., Hadam, B., Spangenberg, B., and Kurz, H. Microelectron. Eng. 2002, 61-62, 407-413
30. Voisin, P., Zelsmann, M., Cluzel, R., Pargon, E., Gourgon, C., and Boussey, J. Microelectron. Eng. 2007, 84, 967-972
31. Le, N. V., Dauksher, W. J., Gehoski, K. A., Resnick, D. J., Hooper, A. E., Johnson, S., and Willson, G. Microelectron. Eng. 2005, 78-79, 464-473
32. Wang, X. D., Chen, Y. F., Wang, L., and Cui, Z. Microelectron. Eng. 2008, 85, 1015-1017