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Volumn 31, Issue , 2008, Pages 80-82
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Influence of hydrogen dilution of silane on the properties of nc-Si:H films grown by layer-by-layer deposition technique
a
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Author keywords
AFM; FESEM; FTIR; LBL; nc Si:H; Raman scattering; XRD
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
ATOMIC SPECTROSCOPY;
AUGER ELECTRON SPECTROSCOPY;
DEPOSITS;
DIFFRACTION;
DILUTION;
ELECTRON ENERGY LOSS SPECTROSCOPY;
ELECTRON MICROSCOPES;
ELECTRON MICROSCOPY;
ELECTRON OPTICS;
EMISSION SPECTROSCOPY;
FIELD EMISSION;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
FOURIER TRANSFORMS;
HYDROGEN;
IMAGING TECHNIQUES;
INFRARED SPECTROSCOPY;
MICROSCOPES;
MICROSCOPIC EXAMINATION;
NANOCRYSTALLINE ALLOYS;
NANOCRYSTALLINE SILICON;
NANOCRYSTALLITES;
NONMETALS;
OPTICAL EMISSION SPECTROSCOPY;
OPTICAL MICROSCOPY;
PHOTONICS;
PIGMENTS;
RAMAN SCATTERING;
RAMAN SPECTROSCOPY;
SCANNING;
SCANNING ELECTRON MICROSCOPY;
SCANNING PROBE MICROSCOPY;
SEMICONDUCTOR DEVICES;
SEMICONDUCTOR MATERIALS;
SILANES;
SILICON;
SPECTROSCOPY;
SPECTRUM ANALYSIS;
TECHNOLOGY;
X RAY ANALYSIS;
X RAY DIFFRACTION ANALYSIS;
X RAY FILMS;
X RAY SPECTROSCOPY;
(1 1 1) ORIENTATION;
(100) SILICON;
(PL) PROPERTIES;
ADVANCED TECHNOLOGIES;
AMORPHOUS MATRICES;
ATOMIC FORCE MICROSCOPY (AFM);
CRYSTAL SILICON;
CRYSTALLINITY;
DIFFRACTION ANGLES;
FIELD EMISSION SCANNING ELECTRON MICROSCOPY (FESEM).;
FLOW RATE (Q);
FOURIER TRANSFORM INFRARED SPECTROSCOPY (MIT FTIR);
H FILMS;
HYDROGEN CONTENTS;
HYDROGEN DILUTION;
HYDROGENATED NANOCRYSTALLINE SILICON (NC-SI:H);
INTERNATIONAL CONFERENCES;
LAYER BY LAYER (LBL) DEPOSITION;
MICRO RAMAN SCATTERING;
NANO-STRUCTURED;
NANOCRYSTALLITE SIZE;
OPTICAL TRANSMISSION SPECTROSCOPY;
X RAY DIFFRACTION (XRD);
XRD PEAKS;
AMORPHOUS FILMS;
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EID: 45749118057
PISSN: 10226680
EISSN: None
Source Type: Book Series
DOI: 10.4028/0-87849-471-5.80 Document Type: Conference Paper |
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Times cited : (6)
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References (6)
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