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Volumn 304, Issue 2, 2007, Pages 352-360
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Structural and transport properties of nanocrystalline silicon thin films prepared at 54.24 MHz plasma excitation frequency
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Author keywords
A1. Nanostructures; A3. Chemical vapour deposition process; B2. Semiconducting silicon
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Indexed keywords
GRAIN SIZE AND SHAPE;
NANOCRYSTALLINE SILICON;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SEMICONDUCTING SILICON;
TRANSPORT PROPERTIES;
CHAMBER PRESSURE;
HYDROGEN DILUTION;
PLASMA EXCITATION FREQUENCY;
THIN FILMS;
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EID: 34248591429
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2007.02.041 Document Type: Article |
Times cited : (14)
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References (33)
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