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Volumn 517, Issue 12, 2009, Pages 3492-3495
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Silicon nanorods prepared by glancing angle catalytic chemical vapor deposition
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Author keywords
Cat CVD; Crystallization; GLAD; Silicon nanorods
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Indexed keywords
CAT-CVD;
CATALYTIC CHEMICAL VAPOR DEPOSITIONS;
CRYSTALLINE VOLUME FRACTIONS;
DIFFERENT SUBSTRATES;
GLAD;
GLANCING ANGLES;
HIGH SUBSTRATE TEMPERATURES;
HYDROGEN DILUTIONS;
LOW TEMPERATURES;
LOW-SUBSTRATE TEMPERATURES;
MICROCRYSTALLINE SI;
NANORODS GROWN;
POST TREATMENTS;
SUBSTRATE TEMPERATURES;
SUBSTRATE TYPES;
AMORPHOUS SILICON;
CHEMICAL VAPOR DEPOSITION;
CRYSTALLIZATION;
HYDROGEN;
MICROCRYSTALLINE SILICON;
NANORODS;
SILANES;
SILICON;
SUBSTRATES;
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EID: 64349118449
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2009.01.082 Document Type: Article |
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Times cited : (8)
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References (8)
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