Crystallization of HWCVD amorphous silicon thin films at elevated temperatures

Thin Solid Films

Volumn 501, Issue 1-2, 2006, Pages 98-101

  Muller, Theo F G ^a   Knoesen, Dirk ^a   Arendse, Chris ^a   Swanepoel, Ryno ^a   Halindintwali, Sylvain ^a   Theron, Chris ^b  

^a UNIVERSITY OF THE WESTERN CAPE   (South Africa)

^b ITHEMBA LABS   (South Africa)

Author keywords

Crystallization; Phase transitions; Silicon; Structural properties

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; PHASE TRANSITIONS; RAMAN SPECTROSCOPY; SILANES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

HOT-WIRE; INTRINSIC MATERIAL; OPTIMUM CONDITIONS; STRUCTURAL PROPERTIES;

AMORPHOUS SILICON;

EID: 32644467055     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.133     Document Type: Conference Paper

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