Diameter control of Ti-catalyzed silicon nanowires

Journal of Crystal Growth

Volumn 267, Issue 3-4, 2004, Pages 613-618

  Sharma, S ^a   Kamins, T I ^a   Williams, R Stanley ^a  

^a HEWLETT PACKARD LABORATORIES   (United States)

Author keywords

A1. Diameter control; A1. Synthesis; A2. Chemical vapor deposition processes; B1. Nanowires; B1. Silicon

Indexed keywords

CATALYST ACTIVITY; CHEMICAL VAPOR DEPOSITION; GROWTH (MATERIALS); NANOSTRUCTURED MATERIALS; OPTOELECTRONIC DEVICES; SYNTHESIS (CHEMICAL); TITANIUM;

DIAMETER CONTROL; GAS-PHASE PRECURSORS; GROWTH RATES; NANOWIRES;

SILICON COMPOUNDS;

EID: 2942666154     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.04.042     Document Type: Article

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