Near-field photolithography with a solid immersion lens

Applied Physics Letters

Volumn 74, Issue 4, 1999, Pages 501-503

  Ghislain, L P ^a   Elings, V B ^a   Crozier, K B ^b   Manalis, S R ^b   Minne, S C ^b   Wilder, K ^b   Kino, G S ^b   Quate, C F ^b  

^a Digital Instruments   (United States)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

ARRAYS; ATOMIC FORCE MICROSCOPY; EFFICIENCY; INTEGRATED CIRCUITS; LASER BEAMS; LIGHTING; OPTICAL FIBERS; OPTICAL INSTRUMENT LENSES; PLASMA ETCHING; SCANNING; SILICON; SUBSTRATES;

DENSE PARALLEL ARRAYS; HIGH OPTICAL EFFICIENCY; SOLID IMMERSION LENS;

PHOTOLITHOGRAPHY;

EID: 0033601626     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.123168     Document Type: Article

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