Wafer-scale Ni imprint stamps for porous alumina membranes based on interference lithography

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Volumn 2, Issue 8-9, 2006, Pages 978-982

  Lee, Woo ^a   Ji, Ran ^a   Ross, Caroline A ^b   Gösele, Ulrich ^a   Nielsch, Kornelius ^a  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^b Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

Alumina; Anodization; Electrodeposition; Lithography; Templates

Indexed keywords

ANODES; CRYSTAL LATTICES; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; NICKEL; POROUS MATERIALS; WAVE INTERFERENCE;

ANODIC ALUMINUM OXIDE(AAO); ANODIZATION; INTERFERENCE LITHOGRAPHY; TEMPLATES;

ALUMINA;

ALUMINUM OXIDE; NICKEL;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; ELECTROPLATING INDUSTRY; NANOTECHNOLOGY;

ALUMINUM OXIDE; ELECTROPLATING; MEMBRANES, ARTIFICIAL; NANOTECHNOLOGY; NICKEL;

EID: 33747171412     PISSN: 16136810     EISSN: 16136829     Source Type: Journal    
DOI: 10.1002/smll.200600100     Document Type: Article

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