A planar layer configuration for surface plasmon interference nanoscale lithography

Applied Physics Letters

Volumn 93, Issue 9, 2008, Pages

  Sreekanth, K V ^a   Murukeshan, V M ^a   Chua, J K ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CELLULAR AUTOMATA; DAMPING; ELECTRIC FIELDS; PATTERN RECOGNITION SYSTEMS; PLASMONS; SILVER;

FINITE-DIFFERENCE TIME-DOMAIN SIMULATIONS; LAYER CONFIGURATION; SURFACE PLASMON;

AUTOMATA THEORY;

EID: 51349104226     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2976630     Document Type: Article

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