Preparation and characterization of nano and microcrystalline ZnO thin films by PLD

Current Applied Physics

Volumn 9, Issue 6, 2009, Pages 1232-1236

  Venkatachalam, S ^a,b   Kanno, Yoshinori ^b,c  

^a NAGOYA UNIVERSITY   (Japan)

^b UNIVERSITY OF YAMANASHI   (Japan)

^c TOKYO METROPOLITAN UNIVERSITY   (Japan)

Author keywords

AFM; FTIR; Nano ZnO thin films; Optical transmittance; PLD; Structure; XPS

Indexed keywords

AFM; FTIR; NANO ZNO THIN FILMS; OPTICAL TRANSMITTANCE; PLD; STRUCTURE; XPS;

ATOMIC FORCE MICROSCOPY; ENERGY GAP; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDRATES; LASERS; METALLIC FILMS; OPACITY; OPTICAL BAND GAPS; OXIDE FILMS; PROGRAMMABLE LOGIC CONTROLLERS; PULSED LASER DEPOSITION; SEMICONDUCTING ZINC COMPOUNDS; SURFACE ROUGHNESS; THIN FILMS; VACUUM DEPOSITION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC; ZINC OXIDE;

OPTICAL FILMS;

EID: 67349209531     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2009.02.003     Document Type: Article

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