Physical and structural properties of ZnO sputtered films

Materials Letters

Volumn 55, Issue 1-2, 2002, Pages 67-72

  Water, Walter ^a   Chu, Sheng Yuan ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

AFM; Annealing; r.f. sputtering; SAW; SEM; XRD; ZnO

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; CRYSTALLIZATION; DEPOSITION; FLOW OF FLUIDS; MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING FILMS; SPUTTER DEPOSITION; STRESSES; SUBSTRATES; SURFACE ROUGHNESS; THERMAL EFFECTS; X RAY DIFFRACTION;

DEPOSITION TEMPERATURE;

ZINC OXIDE;

EID: 0036642617     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(01)00621-8     Document Type: Article

References (23)