Structural, electrical and optical properties of zirconium-doped zinc oxide films prepared by radio frequency magnetron sputtering

Thin Solid Films

Volumn 516, Issue 8, 2008, Pages 2017-2021

  Lv, Maoshui ^a   Xiu, Xianwu ^a   Pang, Zhiyong ^a   Dai, Ying ^a   Ye, Lina ^a   Cheng, Chuanfu ^b   Han, Shenghao ^a  

^a SHANDONG UNIVERSITY   (China)

^b SHANDONG NORMAL UNIVERSITY   (China)

Author keywords

Sputtering; Transparent conducting oxide; Zinc oxide; Zirconium

Indexed keywords

CARRIER CONCENTRATION; ENERGY GAP; MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; ZINC OXIDE;

RADIO FREQUENCY MAGNETRON SPUTTERING; TRANSPARENT CONDUCTING OXIDE;

ZIRCONIUM;

EID: 38649104837     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.173     Document Type: Article

References (29)

1. Gustafsson G., Cao Y., Treacy G.M., Klavetter F., Colaneri N., and Heeger A.J. Nature (London) 357 (1992) 477
2. Adachi C., Nagai K., and Tamoto N. Appl. Phys. Lett. 66 (1995) 2679
3. Kido J., Hongawa K., Pkuyama K., and Nagai K. Appl. Phys. Lett. 68 (1996) 217
4. Rajagopal A., and Khan A. J. Appl. Phys. 84 (1998) 355
5. He Y., and Kanicki J. Appl. Phys. Lett. 76 (2000) 661
6. Hamberg I., and Granqvist C.G. J. Appl. Phys. 60 (1986) 123
7. Ishibashi S., Higuchi Y., Ota Y., and Nakamura K. J. Vac. Sci. Technol., A, Vac. Surf. Films 8 (1990) 1403
8. Qadri S.B., Kim H., Khan H.R., Piqué A., Horwitz J.S., Chrisey D., Kim W.J., and Skelton E.F. Thin Solid Films 377/378 (2000) 750
9. Qadri S.B., Skelton E.F., Lubitz P., Nguyen N.V., and Khan H.R. Thin Solid Films 290/291 (1996) 80
10. Qadri S.B., Khan H.R., Skelton E.F., and Lubitz P. Surf. Coat. Technol. 100/101 (1998) 94
11. Kim H., Horwitz J.S., Kim W.H., Qadri S.B., and Kafafi Z.H. Appl. Phys. Lett. 83 (2003) 3809
12. Paul G.K., Bandyopadhyay S., Sen S.K., and Sen S. Mater. Chem. Phys. 79 (2003) 71
13. Lv M.S., Xiu X.W., Pang Z.Y., Dai Y., and Han S.H. Appl. Surf. Sci. 252 (2005) 2006
14. Lv M.S., Xiu X.W., Pang Z.Y., Dai Y., and Han S.H. Appl. Surf. Sci. 252 (2006) 5687
15. Klug H.P., and Alexander L. X-Ray Diffraction Procedures - For Polycrystalline and Amorphous Materials. 2nd ed., (1974), John Wiley and Sons, New York
16. Ma T.Y., and Moom H.Y. J. Mater. Sci. 9 (1998) 435
17. Choi B.H., and Im H.B. Thin Solid Films 193/194 (1990) 712
18. Gupta V., and Mansingh A. J. Appl. Phys. 80 (1996) 1063
19. Chen M., Pei Z.L., Wang X., Sun C., and Wen L.S. J. Vac. Sci. Technol., A, Vac. Surf. Films 19 (1990) 963
20. Kingery W.D., Bowen H.K., and Uhlmann D.R. Introduction to Ceramics (1976), Willey, New York 58
21. Qadri S.B., Kim H., Horwitz J.S., and Chrisey D.B. J. Appl. Phys. 88 (2000) 6564
22. Lin S.S., Huang J.L., and Šajgalik P. Surf. Coat. Technol. 190 (2005) 39
23. In: Wagner C.D., Riggs W.M., Davis L.E., Moulder J.F., and Muilenberg G.E. (Eds). A reference book of standard data for use in X-ray photoelectron spectroscopy (1979), Perkin-Elmer corporation, Physical Electronics Division, 6509 Flying Cloud Drive, Eden Prairie, Minnesota 55344 100
24. Ellmer K. J. Phys., D, Appl. Phys. 34 (2001) 3097
25. Lee J.H., and Park B.O. Mater. Sci. Eng. B106 (2004) 242
26. Hu J., and Gordon R.G. J. Appl. Phys. 71 (1992) 880
27. Aktaruzzaman A.F., Sharma G.L., and Malhotra L.K. Thin Solid Films 198 (1991) 67
28. Islam M.N., and Hakim M.O. J. Mater. Sci. Lett. 4 (1986) 1125
29. Burstein E. Phys. Rev. 93 (1954) 632.s