Oxygen pressure dependences of structure and properties of ZnO films deposited on amorphous glass substrates by pulsed laser deposition

Japanese Journal of Applied Physics

Volumn 47, Issue 4 PART 1, 2008, Pages 2225-2229

  Zhu, Bai Lin ^a   Zhao, Xing Zhong ^b   Xu, Sheng ^b   Su, Fu Hai ^c   Li, Guo Hua ^c   Wu, Xiao Guang ^c   Wu, Jun ^a   Wu, Run ^a   Liu, Jing ^a  

^a WUHAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b WUHAN UNIVERSITY   (China)

^c INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

Deposition process; Electrical properties and measurements; Laser ablation; Optical properties; Zinc oxide

Indexed keywords

ABLATION; BIOACTIVITY; CARRIER CONCENTRATION; CIVIL AVIATION; CONCENTRATION (PROCESS); CRYSTALLITE SIZE; CRYSTALLITES; ELECTRIC PROPERTIES; EMISSION SPECTROSCOPY; FILM PREPARATION; GLASS; LASER ABLATION; LASERS; LEAKAGE (FLUID); LIGHT EMISSION; LUMINESCENCE; METALLIC FILMS; NANOCRYSTALLINE ALLOYS; NONMETALS; OPTICAL PROPERTIES; ORGANIC POLYMERS; OXYGEN; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; SEMICONDUCTING ZINC COMPOUNDS; STOICHIOMETRY; SURFACE ROUGHNESS; ZINC; ZINC ALLOYS; ZINC OXIDE;

AMORPHOUS GLASSES; CRYSTAL QUALITIES; DEPOSITION PROCESS; ELECTRICAL PROPERTIES AND MEASUREMENTS; GLASS SUBSTRATES; HIGH OXYGEN PRESSURES; LOW OXYGEN PRESSURES; MICROSTRUCTURAL; OPTICAL ENERGY GAPS; OPTOELECTRICAL PROPERTIES; OXYGEN PRESSURE DEPENDENCES; OXYGEN PRESSURES; PHOTO-LUMINESCENCE; PULSED LASERS; STRUCTURE AND PROPERTIES; UV EMISSIONS; ZNO FILMS;

AMORPHOUS FILMS;

EID: 54249162981     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.2225     Document Type: Article

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