Al2O3 plasma production during pulsed laser deposition

European Physical Journal D

Volumn 54, Issue 2, 2009, Pages 467-472

  Caridi, F ^a,b   Torrisi, L ^a,b   Mezzasalma, A M ^a,b   Mondio, G ^a,b   Borrielli, A ^a,b  

^a UNIVERSITY OF MESSINA   (Italy)

^b INFN SEZIONE DI CATANIA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ENERGY DISPERSIVE SPECTROSCOPY; MOLECULAR ORBITALS; NEODYMIUM LASERS; PULSE REPETITION RATE; PULSED LASER DEPOSITION; SPECTROMETERS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; YTTRIUM ALUMINUM GARNET;

ACCELERATION VOLTAGES; DIFFERENT SUBSTRATES; ENERGY DISPERSIVE X-RAY FLUORESCENCE; EQUIVALENT TEMPERATURE; MOLECULAR COMPOSITIONS; PLASMA TEMPERATURE; PULSED-LASER DEPOSITION TECHNIQUE; SURFACE PROFILOMETRY;

PULSED LASERS;

EID: 68549117209     PISSN: 14346060     EISSN: 14346079     Source Type: Journal    
DOI: 10.1140/epjd/e2009-00052-6     Document Type: Article

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