Two modes of capacitively coupled rf discharge in CF4

Plasma Sources Science and Technology

Volumn 19, Issue 6, 2010, Pages

  Proshina, O V ^a   Rakhimova, T V ^a   Rakhimov, A T ^a   Voloshin, D G ^a  

^a MOSCOW STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED VOLTAGES; ATTACHMENT RATE; CAPACITIVELY COUPLED RF DISCHARGE; DISCHARGE CONDITIONS; DISCHARGE MODE; DISCHARGE PROPERTIES; ELECTRON ATTACHMENT; ELECTRONEGATIVE GAS; ELECTRONEGATIVE PLASMAS; ELECTROPOSITIVE PLASMAS; GAS PRESSURES; HIGH TEMPERATURE; IONIZATION RATES; LOW ELECTRON TEMPERATURE; MONTE CARLO CALCULATION; PARTICLE-IN-CELL MONTE CARLO MODELS; SHARP TRANSITION; SIMULATION RESULT; TRANSITION VOLTAGE;

ELECTRIC FIELDS; ELECTRON TEMPERATURE; IONIZATION OF GASES; MONTE CARLO METHODS;

ELECTRIC DISCHARGES;

EID: 78649956160     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/19/6/065013     Document Type: Article

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