Spatial structure of electronegative Ar/CF4 plasmas in capacitive RF discharges

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 10, 2001, Pages 6115-6116

  Kaga, K ^a   Kimura, T ^a   Imaeda, T ^a   Ohe, K ^a  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

EEDF; Electronegativity; Langmuir probe; RF discharge; Spatial structure; Tetrafluorocarbon

Indexed keywords

ARGON; CARRIER CONCENTRATION; CHARGED PARTICLES; CURRENT VOLTAGE CHARACTERISTICS; ELECTRODES; FLUOROCARBONS; MOLECULAR STRUCTURE; NEGATIVE IONS; NUMERICAL METHODS; PLASMAS; PRESSURE EFFECTS;

ELECTRON ENERGY DISTRIBUTION FUNCTION; ELECTRONEGATIVITY; RF DISCHARGES; SPATIAL STRUCTURE; TETRAFLUOROCARBON;

ELECTRIC DISCHARGES;

EID: 0035485165     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.6115     Document Type: Article

References (10)