Negative ion resputtering in Ta2Zn3O8 thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 5, 1999, Pages 2805-2810

  Rack, Philip D ^a   Potter, Michael D ^a   Woodard, Andrew ^b   Kurinec, Santosh ^b  

^a Advanced Vision Technologies Inc   (United States)

^b ROCHESTER INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033424036     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581947     Document Type: Article

References (16)

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