Effect of high substrate bias and hydrogen and nitrogen incorporation on spectroscopic ellipsometric and atomic force microscopic studies of tetrahedral amorphous carbon films

Surface and Coatings Technology

Volumn 205, Issue 7, 2010, Pages 2126-2133

  Panwar, O S ^a   Khan, Mohd Alim ^a   Kumar, Satyendra ^b   Basu, A ^c   Mehta, B R ^d   Kumar, Sushil ^a   Ishpal, ^a  

^a NATIONAL CHEMICAL LABORATORY   (India)

^b INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

^c NATIONAL PHYSICAL LABORATORY   (India)

^d INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

Carbon bonding; SE; Substrate bias; Ta C; Ta C:H; Ta C:N

Indexed keywords

CARBON BONDING; SE; SUBSTRATE BIAS; TA-C; TA-C:H; TA-C:N;

AMORPHOUS CARBON; AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; HYDROGEN; OPTICAL CONSTANTS; OPTICAL FILMS; OPTICAL PROPERTIES; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES; TANTALUM; VACUUM APPLICATIONS;

CARBON FILMS;

EID: 78649738134     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.08.119     Document Type: Article

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