Correlations between substrate bias, microstructure and surface morphology of tetrahedral amorphous carbon films

Vacuum

Volumn 72, Issue 3, 2003, Pages 285-290

  Zhu, Jiaqi ^a   Han, Jiecai ^a   Meng, Songhe ^a   Wang, Jinghe ^a   Zheng, Weitao ^b  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b JILIN UNIVERSITY   (China)

Author keywords

Filtered cathodic vacuum arc (FCVA); Raman spectroscopy; Surface morphology; Tetrahedral amorphous carbon (ta C)

Indexed keywords

ATOMIC FORCE MICROSCOPY; CATHODES; DEPOSITION; MICROSTRUCTURE; MORPHOLOGY; RAMAN SPECTROSCOPY; SEMICONDUCTING SILICON; SINGLE CRYSTALS; SURFACE PHENOMENA;

AMORPHOUS CARBON FILMS;

AMORPHOUS FILMS;

EID: 0142248211     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2003.08.005     Document Type: Article

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